Solar cell in M10 format manufactured in the PV-TEC at Fraunhofer ISE
Image: Fraunhofer ISE
Germany’s Fraunhofer Institute for Solar Energy Systems (Fraunhofer ISE) today unveiled a 120 µm thin solar cell type based on tunnel oxide passivated contact (TOPCon) technology and M10 (182 mm) wafers.
The research institute claims to be the first European scientific entity to switch to large-area M10 silicon wafers for TOPCon cells. “We are very excited that we can now support our industrial partners in optimizing their production processes with this large-area wafer format or even in starting the production of such solar cells,” says Fraunhofer ISE researcher Sabrina Lohmüller.
The Fraunhofer ISE presented the new large format TOPCon solar cell concept to unspecified industry representatives and funding agencies at the recent 20th meeting of the Photovoltaic Technology Advisory Board.
It also said the cell was metallized via screen-printed contact fingers and calibrated by scientists at the German Institute for Solar Energy Research Hamelin (ISFH).
“Achieving an efficiency of 24.0% on the first batch suggests that we will exceed 25% in the next optimization steps,” says Ralf Preu PD, Director of the Photovoltaics Division at Fraunhofer ISE. “This recent success lays the foundation for our medium-term goal of silicon-based tandem solar cells with a large surface area and an efficiency potential of over 30%.”
More details about the cell technology and its potential applications in commercial production have not been disclosed.
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